Aluminium Nitride (AlN) Template on Silicon is made by a PVDNC method. AlN template on Silicon is a cost effective way to replace AlN single crystal substrate.
Specifications
Useful area: 90%
Nominal AlN thickness: 200nm ±10%, one side coated, undopped AlN film
Front Surface: <1nm RMS, as-grown
Back surface: silicon as received
AlN orientation: C-plane (00.1)
Macro Defect Density: <5/cm^2
Wafer base: Silicon [111] N-type, 2" dia x0.5 mm, Resistivity: <5 ohm-cm, one side polished
