1 1

MTI

Undoped Aluminium Nitride (AlN) Template on Sapphire (0001)

Undoped Aluminium Nitride (AlN) Template on Sapphire (0001)

Wafer base size/AlN film thickness/Polish
AlN Template on sapphire is made by a Plasma Vapor Deposition of NanoColumns (PVDNC)-based method. AlN template is a cost effective way to replace AlN single crystal substrate.

Specifications

  • Useful area: 90%
  • Nominal AlN thickness (2 options available):
    • 5000nm ±5%
    • 1000nm ±5%
  • Substrate Sapphire Orientation: c axis (0001) +/- 1.0 deg.
  • Type and Doping for the AlN film: Undoped, Semi-insulating
  • Macro Defect Density: <5 cm-2
  • Front Surface Finish (Al Face): As-grown
  • Back Surface Finish Sapphire: as-received finish
  • Edge Exclusion Area 1mm
  • Package: Single Wafer Container
  • Polish (2 options available):
    • One side polished
    • Two side polished

    Download (MSD) for Aluminium Nitride (AlN)

    View full details